All products
ICP-OES Spectrometry Systems
ICP5000 Dual View ICP-OES Spectrometer
Ultra-Sensitive ICP-OES Analysis
The ICP5000 Dual View ICP-OES Spectrometer is a fully automated high-performance elemental analysis platform engineered for ultra-sensitive analytical applications.
Features
Advanced technologies supported through trusted global partnerships.
- Dual View Plasma Technology
Simultaneous axial and radial plasma viewing for maximum analytical flexibility.
- Advanced Echelle Optical System
High-resolution echelle grating covers 160–900 nm spectral range.
- High-Speed CCD Detection
1024 × 1024 CCD with triple-stage Peltier cooling for ultra-low noise.
- Efficient & Stable RF Plasma Generation
27.12 MHz RF generator delivers stable 500–1600 W plasma.
Specifications
Technical profile.
Technology
ICP-OES
Plasma View
Simultaneous Axial & Radial
RF Generator Frequency
27.12 MHz
RF Power Output
500–1600 W
Optical System
Echelle Grating
Spectral Range
160–900 nm
Detector Type
1024 × 1024 CCD
Detector Cooling
Triple Stage Peltier
Gas Consumption
Low Argon Consumption
Applications
Trace Element AnalysisEnvironmental TestingPharmaceutical AnalysisSemiconductor Chemical AnalysisMetallurgical LaboratoriesIndustrial Analytical Laboratories