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Ion Beam Systems
Ion Beam Milling System 7500
Precision Broad Ion Milling
The Ion Beam Milling System 7500 is a high-performance broad ion beam processing platform engineered for precision nanoscale manufacturing and advanced material processing applications.
Features
Advanced technologies supported through trusted global partnerships.
- Advanced 50 cm Plasma Source
Large-area RF-excited plasma source for uniform broad ion beam generation.
- Superior Nanoscale Milling Precision
Low-divergence beam delivers repeatable nanoscale material removal.
- Intelligent Automated Processing
Nordiko process control platform automates recipe-driven workflows.
- Flexible Wafer & Substrate Compatibility
Supports up to 200 mm wafers and 225 mm square platens.
Specifications
Technical profile.
Technology
Broad Ion Beam Milling
Plasma Source
50 cm RF-Excited Plasma Generator
Beam Type
Low-Divergence Broad Ion Beam
Wafer Compatibility
Up to 200 mm Diameter
Platen Size
Up to 225 mm Square
Substrate Table
Variable-Angle Rotary Design
Cooling System
Integrated Efficient Sample Cooling
Automation System
Nordiko Process Control Platform
Optional Feature
SIMS End-Point Detection
Processing Capability
Nanoscale Precision Milling
Charge Neutralization
Dual Plasma Bridge Neutralizers
Applications
Semiconductor Device FabricationMEMS & Microfabrication ProcessingPhotonics & Optical Device ManufacturingMagnetic Heads & Sensor ProcessingLED & Laser Diode ManufacturingSAW Device FabricationMicrobolometer ProcessingNanoscale Surface EngineeringAdvanced Materials ProcessingPrecision Thin Film Applications